STOCK TITAN

DuPont Innovators in Semiconductor Materials Named 2025 Heroes of Chemistry

Rhea-AI Impact
(Low)
Rhea-AI Sentiment
(Neutral)
Tags
DuPont announced that 13 of its current and former scientists and engineers have been named 2025 Heroes of Chemistry by the American Chemical Society for developing embedded barrier layer technology in semiconductor lithography. This innovation in 193 nm immersion lithography has significantly improved chip fabrication by increasing yield, reducing defects, and enhancing process efficiency. The technology has been widely adopted across the global semiconductor industry, supporting advancements in AI, advanced computing, and consumer electronics. The breakthrough addresses key challenges in immersion lithography by integrating barrier functionality directly into the photoresist, allowing fabricators to simplify processes while reducing materials usage and energy consumption.
DuPont ha annunciato che 13 dei suoi attuali e precedenti scienziati e ingegneri sono stati riconosciuti come Eroi della Chimica 2025 dall'American Chemical Society per aver sviluppato la tecnologia a strato barriera integrato nella litografia dei semiconduttori. Questa innovazione nella litografia a immersione a 193 nm ha migliorato significativamente la fabbricazione dei chip aumentando la resa, riducendo i difetti e migliorando l'efficienza del processo. La tecnologia è stata ampiamente adottata nell'industria globale dei semiconduttori, supportando i progressi nell'intelligenza artificiale, nel calcolo avanzato e nell'elettronica di consumo. Questa scoperta affronta le principali sfide della litografia a immersione integrando la funzionalità barriera direttamente nel fotoresist, permettendo ai produttori di semplificare i processi riducendo al contempo l'uso di materiali e il consumo energetico.
DuPont anunció que 13 de sus científicos e ingenieros actuales y anteriores han sido nombrados Héroes de la Química 2025 por la American Chemical Society por desarrollar la tecnología de capa barrera integrada en la litografía de semiconductores. Esta innovación en la litografía por inmersión a 193 nm ha mejorado significativamente la fabricación de chips al aumentar el rendimiento, reducir defectos y mejorar la eficiencia del proceso. La tecnología ha sido ampliamente adoptada en la industria global de semiconductores, apoyando avances en inteligencia artificial, computación avanzada y electrónica de consumo. Este avance aborda desafíos clave en la litografía por inmersión al integrar la funcionalidad de barrera directamente en el fotoresistente, permitiendo a los fabricantes simplificar los procesos mientras reducen el uso de materiales y el consumo de energía.
DuPont는 현재 및 전직 과학자와 엔지니어 13명이 미국화학회(American Chemical Society)로부터 반도체 리소그래피에 내장형 배리어 층 기술을 개발한 공로로 2025년 화학 영웅(Heroes of Chemistry)으로 선정되었다고 발표했습니다. 193nm 침지 리소그래피 분야의 이 혁신은 칩 제조 공정을 크게 향상시켜 수율을 높이고 결함을 줄이며 공정 효율성을 강화했습니다. 이 기술은 전 세계 반도체 산업에서 널리 채택되어 인공지능, 첨단 컴퓨팅, 소비자 전자제품 분야의 발전을 지원하고 있습니다. 이 돌파구는 배리어 기능을 포토레지스트에 직접 통합하여 침지 리소그래피의 주요 과제를 해결하며, 제조업체가 공정을 단순화하고 재료 사용과 에너지 소비를 줄일 수 있게 합니다.
DuPont a annoncé que 13 de ses scientifiques et ingénieurs actuels et anciens ont été nommés Héros de la Chimie 2025 par l'American Chemical Society pour avoir développé la technologie de couche barrière intégrée dans la lithographie des semi-conducteurs. Cette innovation dans la lithographie par immersion à 193 nm a considérablement amélioré la fabrication des puces en augmentant le rendement, en réduisant les défauts et en améliorant l'efficacité des processus. La technologie a été largement adoptée dans l'industrie mondiale des semi-conducteurs, soutenant les avancées en intelligence artificielle, informatique avancée et électronique grand public. Cette percée répond aux principaux défis de la lithographie par immersion en intégrant la fonctionnalité barrière directement dans le photo-résist, permettant aux fabricants de simplifier les processus tout en réduisant la consommation de matériaux et d'énergie.
DuPont gab bekannt, dass 13 seiner aktuellen und ehemaligen Wissenschaftler und Ingenieure von der American Chemical Society als Heroes of Chemistry 2025 ausgezeichnet wurden, weil sie die Embedded Barrier Layer-Technologie in der Halbleiterlithographie entwickelt haben. Diese Innovation in der 193-nm-Immersionslithographie hat die Chipfertigung erheblich verbessert, indem sie die Ausbeute steigerte, Defekte reduzierte und die Prozesseffizienz erhöhte. Die Technologie wurde weltweit in der Halbleiterindustrie breit übernommen und unterstützt Fortschritte in KI, fortschrittlichem Computing und Unterhaltungselektronik. Der Durchbruch löst zentrale Herausforderungen der Immersionslithographie, indem die Barrierefunktionalität direkt in den Fotolack integriert wird, was Herstellern ermöglicht, Prozesse zu vereinfachen und gleichzeitig Materialverbrauch und Energiebedarf zu senken.
Positive
  • None.
Negative
  • None.

Breakthrough in Semiconductor Lithography Recognized by the American Chemical Society

WILMINGTON, Del., June 10, 2025 /PRNewswire/ -- DuPont (NYSE: DD) today announced that 13 of its current and former scientists and engineers have been named 2025 Heroes of Chemistry by the American Chemical Society (ACS) for an innovative program that progressed semiconductor lithography.

The award recognizes the collaborative development of embedded barrier layer technology, a transformative advancement in 193 nm immersion lithography that significantly improved chip fabrication processes by increasing yield, reducing defects, and enhancing process efficiency. The honored team includes Deyan Wang, Ph.D., Cong Liu, Ph.D., Doris Kang, Ph.D., MingQi Li, Ph.D., Shintaro Yamada, Ph.D., Stefan Caporale, Chengbai Xu, Ph.D., George Barclay, Ph.D., ChunYi Wu, Joon Seok Oh, Li Jia, Jinrong Liu, and Anthony Zampini.

Formulations containing embedded barrier technology have been widely adopted in lithography processes across the global semiconductor industry, supporting advancements for technologies such as artificial intelligence (AI), advanced computing and consumer electronics.

Embedded barrier layer technology addresses key challenges in early immersion lithography such as defectivity and process stability. By integrating barrier functionality directly into the photoresist, fabricators can simplify their lithography processes, with lower materials usage and reduced energy consumption. This advanced technology contributes to improvements in operational efficiency and sustainability for high-volume chip fabrication.

"The introduction of embedded barrier layer technology marked a critical breakthrough innovation for the global semiconductor industry, by extending the capabilities of what is possible with 193 immersion lithography to support the production of advanced, energy-efficient chips," said Randal King, Vice President of R&D/Technology, Qnity™, DuPont Electronics. "Embedded barrier layer solutions were first implemented over a decade ago and continue to be widely used today. The success of this team demonstrates how materials innovation is powering amazing leaps in technology."

The ACS Heroes of Chemistry Award is presented annually to industrial scientists whose work has led to the successful development and commercialization of impactful chemistry-based products. The 2025 awardees will be formally recognized at a ceremony in August, as part of the ACS Fall 2025 meeting in Washington, D.C.

About DuPont

DuPont (NYSE: DD) is a global innovation leader with technology-based materials and solutions that help transform industries and everyday life. Our employees apply diverse science and expertise to help customers advance their best ideas and deliver essential innovations in key markets including electronics, transportation, construction, water, healthcare and worker safety. More information can be found at www.dupont.com. Investors can access information included on the Investor Relations section of the website at investors.dupont.com.

DuPont™, the DuPont Oval Logo, and all trademarks and service marks denoted with ™, ℠ or ® are owned by affiliates of DuPont de Nemours, Inc. unless otherwise noted.

Cision View original content to download multimedia:https://www.prnewswire.com/news-releases/dupont-innovators-in-semiconductor-materials-named-2025-heroes-of-chemistry-302476596.html

SOURCE DuPont

FAQ

What achievement did DuPont (DD) scientists receive in 2025 from the American Chemical Society?

13 DuPont scientists received the 2025 Heroes of Chemistry award for developing embedded barrier layer technology in semiconductor lithography, which improved chip fabrication processes.

How does DuPont's embedded barrier layer technology improve semiconductor manufacturing?

The technology increases yield, reduces defects, enhances process efficiency, simplifies lithography processes, and reduces materials usage and energy consumption in chip fabrication.

What industries benefit from DuPont's semiconductor lithography innovation?

The technology supports advancements in artificial intelligence (AI), advanced computing, and consumer electronics industries.

When will DuPont's scientists receive their Heroes of Chemistry award?

The 2025 awardees will be formally recognized at a ceremony in August during the ACS Fall 2025 meeting in Washington, D.C.
Dupont De Nemours Inc

NYSE:DD

DD Rankings

DD Latest News

DD Stock Data

27.65B
417.48M
0.16%
73.13%
0.82%
Specialty Chemicals
Plastic Materials, Synth Resins & Nonvulcan Elastomers
Link
United States
WILMINGTON
OSZAR »